MATTSON TECH Profile

Mattson Technology, Inc. designs, manufactures, and markets semiconductor wafer processing equipment used in the fabrication of integrated circuits for the semiconductor manufacturing industry worldwide. It offers dry strip and rapid thermal processing equipment, and isotropic and low aspect ratio reactive ion. The company's dry strip products encompass both 200 and 300 millimeter products on its Aspen platform, and its high productivity Suprema and Alpine, using its patented, inductively coupled plasma (ICP) technologies. Its rapid thermal processing product line includes Helios XP that features a temperature measurement and control system combined with an active compensation algorithm for various wafer emissivities; Helios, which features a model based temperature measurement and control system for achieving superior device performance; Millios, the millisecond (ms) anneal system, a solution for ultra-shallow junction formation, advanced silicides, and other processes requiring short anneal times with precise control; and Atmos, a dual-chamber, single-wafer 300 millimeter RTP system for high-volume chip manufacturing through the 32 nanometer technology node. Mattson Technology also offers Nexion that features its proprietary inductively coupled plasma (ICP) source with wafer bias capability that enables independent control of ion energy and ion density at low processing pressures. The company sells its products directly, as well as through distribution agreements to foundries, and memory and logic device manufacturers. Mattson Technology was founded in 1988 and is headquartered in Fremont, California.

 

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